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|--Powder ALD/CVD
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|--Evaporator
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How is the temperature uniformity of this system?

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The process chamber features a dual inner/outer cavity design, delivering exceptional temperature control uniformity.

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How does the system control particle contamination?

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The chamber features high-vacuum transfer technology and delivers exceptional particle performance, enabling ultra-clean production.

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Does CBATCH need thermal regulation during processing?

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From right to left are the preheating chamber, inner/outer process chambers, and cooling chamber, eliminating the need for repeated thermal regulation (heating/cooling cycles) and enabling continuous production.

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What are main process technology applications of CBATCH?

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Passivation for Mini LED backlight units, Brightness enhancement and passivation for RGB (red/yellow) LEDs, High-power GaN LED passivation, VCSEL (Vertical-Cavity Surface-Emitting Laser) passivation, Sidewall passivation for Micro LED displays, etc.

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What are advantages of films deposited by CBATCH compared to competing solutions?

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1. Improves device yield rate under "double 85" testing conditions; 2. Reduces device reverse leakage current; 3. Ultra-high throughput effectively lowers COO (Cost of Ownership); 4. Multi-chamber design ensures higher cleanliness levels, suitable for high-volume production of Micro LED & micro-display, automotive-grade components and other premium applications

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