GM R&D Powder ALD

Yunmao Product Overview

The GM system enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control, ALD precursor cylinders, automatic temperature control valves, and industrial-grade safety systems.

Yunmao Technical Advantages

Reaction Temperature: RT-300°C

Precursor Heating: RT-200°C

Coating Non-uniformity: <3%

Sample Capacity: 100g/1000g (customizable for batch & scalable production）

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

产品视频

Representative paper on scientific research applications

Constructing a High-Energy and Durable Single-Crystal NCM811 Cathode for All-Solid-State Batteries by a Surface Engineering Strategy

keywords：LiNi0.8Co0.1Mn0.1O2, high-nickel cathode, all-solid-state battery, atomic layer deposition, lithium niobium oxides

date：18 June,2025

The Key Role of Grain Boundary Dynamics in Revolutionizing the Potential of Solid Electrolytes

keywords：The Key Role of Grain Boundary Dynamics in Revolutionizing the Potential of Solid Electrolytes

date：18 June,2024

Simultaneous Enhancement of Interfacial Stability and Kinetics of Single-Crystal LiNi0.6Mn0.2Co0.2O2 through Optimized Surface Coating and Doping

keywords：Simultaneous Enhancement of Interfacial Stability and Kinetics of Single-Crystal LiNi0.6Mn0.2Co0.2O2 through Optimized Surface Coating and Doping

date：25 November,2020

Application

Lithium-ion Battery

Catalysts and other powder materials

FAQ

What products are included in Yunmao Technology's powder ALD series?

Yunmao powder ALD equipment includes two main categories: R&D and Industrial systems. The GM series belongs to the R&D category, designed primarily for scientific applications, with series products GM100 and GM1000.

What are the advantages of ALD coating compared to traditional methods like solution-phase processes?

ALD addresses the critical limitations of traditional solution-phase and solid-phase coating methods—such as poor uniformity, uncontrolled thickness, and substrate damage—through atomic-level precision, strong interfacial bonding, mild processing conditions, and exceptional conformity on complex structures.

What types of thin films can the GM system primarily deposit?

Oxides：Al2O3、ZnO2、HfO2、TiO2、SiO2、SnO2 etc.；Phosphates & Lithium Compounds：TiPO4、AlPO4、LiNbO3、LixTiyOz, etc.；Metals: Cu、Pt、W thin films, etc.

What is the maximum powder processing capacity of the GM series?

The processing capabilities of GM100 and GM1000 are 100g and 1000g respectively

What are the applications of GM?

1.Battery Applications:Enhances battery performance by optimizing electrode materials;Improves cycling stability and energy density; 2.Catalysis Applications: Enables synthesis of high-efficiency catalysts; Tailors active site distribution and surface reactivity; 3.Metal Powder Processing:Improves powder flowability and handling;Enhances moisture/oxidation resistance; Optimizes sintering interface bonding; 4.Advanced Materials Development:Nanomaterial surface functionalization; Fabrication of novel thin-film architectures 5. Pharmaceutical Applications: Modifies powder characteristics for better compressibility; Enables controlled drug release profiles

Related products

KG Powder ALD for Mass Production

The KG series powder ALD is primarily used for high-precision thin-film deposition of various powder materials. This system can deposit coating films ranging from atomic layer to nanoscale thickness on micron-sized powder surfaces, featuring ultra-high sensitivity, uniformity and repeatability.

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

QBT-T is designed for micro/nano fabrication, powder or electrode sheet coating.

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QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System

QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

CBATCH 100s Batch Thermal ALD

GM R&D Powder ALD

PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System

QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

QBT-I Dual-chamber High-speed Evaporator

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

PBATCH Batch PEALD

SICE-Y8 SiC Epitaxy CVD System

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MINI R&D Desktop ALD

CBATCH 300s Batch Thermal ALD

MPCVD Diamond CVD

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