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Yunmao Yunmao Home > Products > For R&D > Thermal Batch ALD > CBATCH 100s Batch Thermal ALD

CBATCH 100s Batch Thermal ALD

YunmaoProduct Overview

CBATCH 100s is an atomic layer deposition (ALD) system designed for 4/6-inch LED production lines and oxide layer encapsulation coating on micro/nano-devices fabricated on patterned and planar sapphire substrates.

YunmaoTechnical Advantages

Increases throughput while reducing COO

Scalable modular design maintains coating quality when expanding capacity/chambers

Unique gas flow design achieves: WIW NU <1.5%, W2W <2.5%, B2B<2.5%

Exclusive exhaust treatment system extends vacuum pump maintenance cycles, reducing costs

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Products category

For Industry

ALD

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Plasma Batch ALD

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PBATCH Batch PEALD

Thermal Batch ALD

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CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

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MPCVD Diamond CVD

Epitaxy

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SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

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KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

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Single Wafer ALD

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QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

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Single-Cathode Vertical Sputtering

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QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

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QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

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QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

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QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

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QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

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GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Application

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Mini/Micro LED

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VCSEL

FAQ

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How is the temperature uniformity of this system?

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The process chamber features a dual inner/outer cavity design, delivering exceptional temperature control uniformity.

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What are main process technology applications of CBATCH？

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Passivation for Mini LED backlight units, Brightness enhancement and passivation for RGB (red/yellow) LEDs, High-power GaN LED passivation, VCSEL (Vertical-Cavity Surface-Emitting Laser) passivation, Sidewall passivation for Micro LED displays, etc.

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What are advantages of films deposited by CBATCH compared to competing solutions？

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1. Improves device yield rate under "double 85" testing conditions； 2. Reduces device reverse leakage current； 3. Ultra-high throughput effectively lowers COO (Cost of Ownership)； 4. Multi-chamber design ensures higher cleanliness levels, suitable for high-volume production of Micro LED & micro-display, automotive-grade components and other premium applications

Related products

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PBATCH Batch PEALD

PBATCH realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO₂, Al₂O₃, TiO₂) on various substrates, including glass, organic materials, polymers, metals, and ceramics.This system delivers exceptional coating uniformity, repeatability, and reliability while achieving industry-leading throughput and yield rates
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CBATCH 300s Batch Thermal ALD

CBATCH 300s enables fully automated, high-throughput continuous production, significantly improving throughput and reducing COO (cost of ownership). The system delivers atomic-level precision control, producing pinhole-free, high-quality thin films suitable for high-κ dielectric layers, metal gate deposition, encapsulation coatings, electroplating seed layers, which are widely used in Mini/Micro LED, third-generation semiconductors, and integrated circuit manufacturing.

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Yunmao
QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System
QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System
CBATCH 100s Batch Thermal ALD
GM R&D Powder ALD
PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System
QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)
QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System
QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System
QBT-I Dual-chamber High-speed Evaporator
KG Powder ALD for Mass Production
SCA Powder CVD for Mass Production
QBT-A High Vacuum Plasma-enhanced ALD System
QBT-J Four-chamber Ultra-high Vacuum GLAD System
QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator
PBATCH Batch PEALD
SICE-Y8 SiC Epitaxy CVD System
QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System
MINI R&D Desktop ALD
CBATCH 300s Batch Thermal ALD
MPCVD Diamond CVD

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