PBATCH Batch PEALD

Yunmao Product Overview

PBATCH realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO₂, Al₂O₃, TiO₂) on various substrates, including glass, organic materials, polymers, metals, and ceramics. This system delivers exceptional coating uniformity, repeatability, and reliability while achieving industry-leading throughput and yield rates

Yunmao Technical Advantages

Sample Size: Up to 12 inch

Fully automated, multi-wafer, high-volume production

Deposits optical films with visible reflectance R<0.1%

Batch-to-batch film thickness non-uniformity of Ru <1%

Industry-leading coating uniformity, repeatability, and reliability

Enables conformal deposition on entire lens surfaces and 3D micro/nano structures

The system enables in-situ plasma cleaning and alternating deposition of multiple thin-film combinations (e.g., SiO₂/Al₂O₃/TiO₂) within a single process chamber.

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Application

Optics

Vehicle Lens

Surveilance Lens

FAQ

What are technical advantages of PBATCH?

1. Enables low-temperature plasma processing; 2. Maximum substrate size: 14 inches; 3. Built-in plasma cleaning function in process chamber; 4. Supports arbitrary thin-film stacking processes

What are applications of PBATCH？

Optical modules, lenses, traditional COB, and advanced packaging

Can PBATCH deposit AR coatings?

Definitely. Reflectance <0.1% in the visible spectrum

How does PBATCH perform in terms of film layer reliability?

1. Post-coating inspection: Clean appearance, free from bubbles and contamination 2. After surface pretreatment: Maintains flawless appearance with no bubbles or stains 3. Thermal shock resistance: No blistering, delamination or cracking observed 4. Extended reliability: Passes 1000-hour DH test (85°C/85%RH) with no blistering, delamination or cracking

Related products

CBATCH 300s Batch Thermal ALD

CBATCH 300s enables fully automated, high-throughput continuous production, significantly improving throughput and reducing COO (cost of ownership). The system delivers atomic-level precision control, producing pinhole-free, high-quality thin films suitable for high-κ dielectric layers, metal gate deposition, encapsulation coatings, electroplating seed layers, which are widely used in Mini/Micro LED, third-generation semiconductors, and integrated circuit manufacturing.

CBATCH 100s Batch Thermal ALD

CBATCH 100s is an atomic layer deposition (ALD) system designed for 4/6-inch LED production lines and oxide layer encapsulation coating on micro/nano-devices fabricated on patterned and planar sapphire substrates.

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QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System

QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

CBATCH 100s Batch Thermal ALD

GM R&D Powder ALD

PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System

QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

QBT-I Dual-chamber High-speed Evaporator

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

PBATCH Batch PEALD

SICE-Y8 SiC Epitaxy CVD System

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MINI R&D Desktop ALD

CBATCH 300s Batch Thermal ALD

MPCVD Diamond CVD

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