For Industry
For R&D
ALD
Plasma Batch ALD
PBATCH Batch PEALD
Thermal Batch ALD
CBATCH 100s Batch Thermal ALD
CBATCH 300s Batch Thermal ALD
CVD
MPCVD Diamond CVD
Epitaxy
SICE-Y8 SiC Epitaxy CVD System
Powder ALD/CVD
KG Powder ALD for Mass Production
SCA Powder CVD for Mass Production
Single Wafer ALD
QBT-A High Vacuum Plasma-enhanced ALD System
MINI R&D Desktop ALD
Sputter
Single-Cathode Vertical Sputtering
QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System
QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)
PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System
Multi-Cathode Vertical Sputtering
QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System
Multi-Cathode Co-Sputtering
QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System
MP L Customized Series
QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System
Evaporator
QBT-I Dual-chamber High-speed Evaporator
QBT-J Four-chamber Ultra-high Vacuum GLAD System
QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator
Powder ALD
GM R&D Powder ALD
QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System
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