CBATCH 300s Batch Thermal ALD

Yunmao Product Overview

CBATCH 300s enables fully automated, high-throughput continuous production, significantly improving throughput and reducing COO (cost of ownership). The system delivers atomic-level precision control, producing pinhole-free, high-quality thin films suitable for high-κ dielectric layers, metal gate deposition, encapsulation coatings, electroplating seed layers, which are widely used in Mini/Micro LED, third-generation semiconductors, and integrated circuit manufacturing.

Yunmao Technical Advantages

3D coating with atomic-level precision control

Coating for ultra-high aspect ratio (1000:1) structures

Fully automated, multi-sheet, multi-cavity, continuous production

Fully automated loading/unloading with high precision and repeatability

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Application

Mini/Micro LED

VCSEL

FAQ

How is the temperature uniformity of this system?

The process chamber features a dual inner/outer cavity design, delivering exceptional temperature control uniformity.

How does the system control particle contamination?

The chamber features high-vacuum transfer technology and delivers exceptional particle performance, enabling ultra-clean production.

Does CBATCH need thermal regulation during processing?

From right to left are the preheating chamber, inner/outer process chambers, and cooling chamber, eliminating the need for repeated thermal regulation (heating/cooling cycles) and enabling continuous production.

What are main process technology applications of CBATCH？

Passivation for Mini LED backlight units, Brightness enhancement and passivation for RGB (red/yellow) LEDs, High-power GaN LED passivation, VCSEL (Vertical-Cavity Surface-Emitting Laser) passivation, Sidewall passivation for Micro LED displays, etc.

What are advantages of films deposited by CBATCH compared to competing solutions？

1. Improves device yield rate under "double 85" testing conditions； 2. Reduces device reverse leakage current； 3. Ultra-high throughput effectively lowers COO (Cost of Ownership)； 4. Multi-chamber design ensures higher cleanliness levels, suitable for high-volume production of Micro LED & micro-display, automotive-grade components and other premium applications

Related products

PBATCH Batch PEALD

PBATCH realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO₂, Al₂O₃, TiO₂) on various substrates, including glass, organic materials, polymers, metals, and ceramics.This system delivers exceptional coating uniformity, repeatability, and reliability while achieving industry-leading throughput and yield rates

CBATCH 100s Batch Thermal ALD

CBATCH 100s is an atomic layer deposition (ALD) system designed for 4/6-inch LED production lines and oxide layer encapsulation coating on micro/nano-devices fabricated on patterned and planar sapphire substrates.

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QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System

QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

CBATCH 100s Batch Thermal ALD

GM R&D Powder ALD

PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System

QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

QBT-I Dual-chamber High-speed Evaporator

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

PBATCH Batch PEALD

SICE-Y8 SiC Epitaxy CVD System

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MINI R&D Desktop ALD

CBATCH 300s Batch Thermal ALD

MPCVD Diamond CVD

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